发明名称 Superluminescent diode with offset current injection regions
摘要 A superluminescent diode includes a semiconductor substrate of a first conductivity type. A lower cladding layer of the first conductivity type is provided on the semiconductor substrate. An active layer is provided on the lower cladding layer. An upper cladding layer of a second conductivity type opposite to the first conductivity type is provided on the active layer. A current blocking layer of the first conductivity type is buried in the upper cladding layer. The current blocking layer has a stripe-shaped groove serving as a current-injection region. The current-injection region is formed in a manner that it extends from an end face of a chip to the inside of the chip, and has a length shorter than that of the chip. The current blocking layer is made of a material having a band gap energy not greater than that of the active layer and a refractive index not smaller than that of the active layer so that light advancing in the active layer is absorbable.
申请公布号 US5574304(A) 申请公布日期 1996.11.12
申请号 US19950394034 申请日期 1995.02.24
申请人 ROHM CO., LTD. 发明人 MUSHIAGE, MASATO;YAMAUCHI, TATSUO;SHAKUDA, YUKIO
分类号 H01L33/00;H01L33/14;H01L33/44;(IPC1-7):H01L27/15;H01L29/06;H01L31/00 主分类号 H01L33/00
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