| 摘要 |
<p>Method of polishing a hard surface comprises applying an abrasive-free compsn. formed from: (i) an aq. phase; and (ii) a silicon phase. The phases have refractive indices within 0.002 of each other. Phase (i) contains (a) H2O, and (b) a water-soluble hydrophilic organic solvent. Phase (ii) contains (c) a volatile methyl siloxane; (d) a siloxane polyether; and (e) an organo-Si resin. Solvent (b) comprises ethylene glycol, propylene glycol, trimethylene glycol, ethylene glycol n-butyl ether, ethylene glycol phenyl ether, diethylene glycol methyl ether, diethylene glycol n-butyl ether, propylene glycol methyl ether, propylene glycol n-propyl ether, propylene glycol n-butyl ether, propylene glycol phenyl ether, dipropylene glycol n-propyl ether, dipropylene glycol-n-butyl ether, triethylene glycol methyl ether, triethylene glycol n-butyl ether, tripropylene glycol methyl ether or tripropylene glycol n-butyl ether. Method of polishing a hard surface comprises applying an abrasive-free compsn. formed from: (i) an aq. phase; and (ii) a silicone phase. The phases have refractive indices within 0.002 of each other. Phase (i) contains (a) H2O; and (b) a water-soluble hydrophilic organic solvent. Phase (ii) contains (c) a volatile methyl siloxane; (d) a siloxane polyether; and (e) an organo-Si resin. Solvent (b) comprises, e.g. ethylene glycol, trimethylene glycol, diethylene glycol n-butyl ether, tripropylene glycol n-butyl ether, etc.. Also claimed is a polish for hard surfaces.</p> |
