发明名称 SEMICONDUCTOR DEVICE,ITS PREPARATION,THREE ELEMENT DIELECTRIC COMPOUND,ITS METHOD OF APPLICATION AND PREPARATION OF DIELECTRIC COMPOUND LAYER
摘要 <p>PROBLEM TO BE SOLVED: To effectively ensure adhesion between layers regardless of the chemical constitution, and to increase the surface characteristics. SOLUTION: A method for manufacturing a semiconductor device includes a step for forming a first layer 3 of dielectric materials on at least one part of a structure provided on a substrate 1 of semiconductor materials, and a step for forming a second layer 5 of dielectric materials overlapped on at least one area of the first layer 3. This method also includes a step for forming an intermediate adhesive layer 6 including ternary element compound of silicon, oxygen, and carbon in an area in which the first layer 3 and the second layer 5 are overlapped.</p>
申请公布号 JPH08279507(A) 申请公布日期 1996.10.22
申请号 JP19950333640 申请日期 1995.12.21
申请人 SGS THOMSON MICROELETTRONICA SPA 发明人 MAURITSUTSUIO BATSUKETSUTA;RUKA ZANOTSUTEI;JIYUZETSUPE KUEIROORO
分类号 H01L21/316;H01L21/318;H01L21/768;H01L23/532;(IPC1-7):H01L21/316 主分类号 H01L21/316
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