发明名称 |
SEMICONDUCTOR DEVICE,ITS PREPARATION,THREE ELEMENT DIELECTRIC COMPOUND,ITS METHOD OF APPLICATION AND PREPARATION OF DIELECTRIC COMPOUND LAYER |
摘要 |
<p>PROBLEM TO BE SOLVED: To effectively ensure adhesion between layers regardless of the chemical constitution, and to increase the surface characteristics. SOLUTION: A method for manufacturing a semiconductor device includes a step for forming a first layer 3 of dielectric materials on at least one part of a structure provided on a substrate 1 of semiconductor materials, and a step for forming a second layer 5 of dielectric materials overlapped on at least one area of the first layer 3. This method also includes a step for forming an intermediate adhesive layer 6 including ternary element compound of silicon, oxygen, and carbon in an area in which the first layer 3 and the second layer 5 are overlapped.</p> |
申请公布号 |
JPH08279507(A) |
申请公布日期 |
1996.10.22 |
申请号 |
JP19950333640 |
申请日期 |
1995.12.21 |
申请人 |
SGS THOMSON MICROELETTRONICA SPA |
发明人 |
MAURITSUTSUIO BATSUKETSUTA;RUKA ZANOTSUTEI;JIYUZETSUPE KUEIROORO |
分类号 |
H01L21/316;H01L21/318;H01L21/768;H01L23/532;(IPC1-7):H01L21/316 |
主分类号 |
H01L21/316 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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