| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a system and a method for correcting the design of a submicron integrated circuit efficiently and accurately. SOLUTION: In a system and a method for performing optical proximity correction on mask design of an integrated circuit by first performing optical proximity correction on a library of cells used to manufacture the integrated circuit, previously tested cells 202, 204 are imported onto mask design 208, and all the cells are arranged being spaced by minimum distance S in order to guarantee no generation of proximity effect between elements completely integrated in the different cells. Optical proximity correction technique is executed on mask design by performing proximity correction only on elements (for instance, lines) that are not completely integrated in the cells.</p> |
