SEMICONDUCTOR DEVICE AND ITS MANUFACTURE

摘要

PURPOSE: To form a contact which can tolerate a misalignment at the time of forming a contact which connects a diffusion layer of a second conductivity demarcated by element separating areas on a semiconductor substrate of a first conductivity to wiring. CONSTITUTION: An element separating area is formed as a second insulating area (23a) which self-aligns with a first insulating area (5Aa) below the area (23a) by using a material having larger etch selectivity against an interlayer insulating film 9 in which the contact hole 12 of the second insulating area (23a) is opened.