| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method, in which a thin film sacrifice layer is easily removed, for M×N pieces of thin film actuated mirror arrays SOLUTION: An active matrix 220 provided with a substrate, a connecting terminal, and a transistor is prepared, and on the active matrix 220, a thin film sacrifice layer 240 is formed, and then, an ion is injected to the thin film sacrifice layer 240 so as to lower its structural characteristic, and an empty slot array is formed on the thin film sacrifice layer 240. On the empty slot array, an array of conduits 235 is formed, and an elastic layer 270 made of an insulating material is formed on the array of conduits 235, so that a multilayer structure 500 consisting of a first thin film layer 250, a deformable layer 280, a second thin film layer 260, and the elastic layer 270 is formed. Then, the multilayer structure is patterned in an array 400 of M×N pieces of semifinished condition actuated mirrors 401, and a thin film protecting layer 290 covering the upper face and side faces completely is formed in each array, and then, the thin film sacrifice layer is removed by using etching liquid. Subsequently, the etching liquid is washed down by means of rinsing liquid, and then, the rinsing liquid is removed, and consequently, the thin film protecting layer is removed.
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