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发明名称
Strahlungsempfindliche, positiv arbeitende Resistmasse
摘要
申请公布号
DE69121739(D1)
申请公布日期
1996.10.10
申请号
DE19916021739
申请日期
1991.02.22
申请人
SUMITOMO CHEMICAL CO., LTD., OSAKA, JP
发明人
HIOKI, TAKESHI, TONDABAYASHI-SHI, OSAKA-FU, JP;KURIO, SEIKO, KAWANISHI-SHI, HYOGO-KEN, JP;UETANI, YASUNORI, TOYANAKA-SHI, OSAKA-FU, JP;DOI, YASUNORI, TAKATSUKI-SHI, OSAKA-FU, JP
分类号
C08G8/24;G03F7/023;(IPC1-7):G03F7/023
主分类号
C08G8/24
代理机构
代理人
主权项
地址
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