发明名称 POLYMER
摘要 PROBLEM TO BE SOLVED: To provide a new polymer having good machining stability, sensitive to UV irradiation, an electron beam, and X-rays, and suitable for the use in a DUV region due to particularly high optical transparency by using a specific molecular weight including specific respective structure units in the polymer chain. SOLUTION: This polymer includes repetitive structure units expressed by formulas I-IV in the polymer chain, and it has the molecular weight (M) of 5.5&times;10<3> -5.5&times;10<5> measured by gel transmission chromatography. In the formulas I-IV, R1 , R2 are independent of each other, and they indicate straight chain-like or branch chain-like alkyl group having 1-6 carbon atoms or unsubstituted or methy-substituted cycloalkyl group having 3-6 carbon atoms. R3 -R6 independently indicate hydrogen atom or methy group, R7 -R10 independently indicate hydrogen atom, or alkyl group having 1-6 carbon atoms, and (w), (x), (y), (z) indicate numerals larger than 1 or equal to 1.
申请公布号 JPH08227155(A) 申请公布日期 1996.09.03
申请号 JP19950291710 申请日期 1995.10.13
申请人 O C G MICROELECTRON MATERIALS INC 发明人 KAARUURORENTSU MERUTESUDORUFU;PARUKARU ARUFUREETO FUARUSHIGUNO;NORUBERUTO MIYUNTSUERU;HANSUUTOOMASU SHIYATSUHATO
分类号 C08F8/00;C08F12/00;C08F212/14;G03F7/039;H01L21/027 主分类号 C08F8/00
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