| 摘要 |
<p>A novel compound is proposed for cleaning solid surfaces, in particular for removing ion contaminants from the surfaces of semiconductor wafers and dielectrics and for cleaning surfaces of metals used in the manufacture of various types of semiconductor devices and integrated circuits. The proposed compound is a solution of sulpho-maleic anhydride in water or alcohol in water, the proportion of sulpho-maleic anhydride being 0.1-70 wt.%.</p> |
