| 摘要 |
A silver halide photographic light-sensitive material is disclosed. The light-sensitive material comprises a support having thereon a silver halide emulsion layer and optionally a hydrophilic colloid layer, at least one of said emulsion layer and said hydrophilic colloid layer contains a water-soluble polymer which comprises repeating unit represented by formula 1 in an amount of 10 to 100 mol %, and a electric conductive layer being provided between the support and the silver halide emulsion layer and comprising a binder and fine particles of an electric conductive crystalline metal oxide of ZnO, Ti02, SnO2, Al2O3, In2O3, SiO2, MgO, BaO, MoO3, V2O5 or a mixture thereof, each of which has a volumetric resistivity of not higher than 107 OMEGA m; <IMAGE> (1) wherein R1 and R2 are each independently a hydrogen atom, an alkyl group, a halogen atom or a -CH2COOM1, in which M1 is a hydrogen atom or an alkyl group having 1 to 8 carbon atoms; L is -CONH-, -NHCO-, -COO-, -OCO-, -SO2-, -HSO2-, -SO2NH- or -O-; J is an alkylene group, an arylene group or an aralkylene group; Q is a hydrogen atom, -R3, <IMAGE> <IMAGE> <IMAGE> in which M2 is a hydrogen atom or a cation; R9 is an alkyl group having 1 to 4 carbon atoms; R3, R4, R5, R6, R7 and R8 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an alkenyl group, a phenyl group, an aralkyl group; X is an anion; M is a hydrogen atom or a cation; p and q are each 0 or 1; and Y is a hydrogen atom or a -(L)p-(J)q-Q group. The light-sensitive material has a good antistatic property without fogging due to a ultra rapid processing.
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