PROJECTION EXPOSURE APPARATUS, OPTICAL MEMBER, AND DEVICE MANUFACTURING METHOD

摘要

A projection exposure apparatus 100 projects the pattern of an original 6 onto a substrate 7 via a projection optical system PL. The projection exposure apparatus 100 includes an original stage 5 which holds the original 6 , a substrate stage 8 which holds the substrate 7 , and a measurement unit. The measurement unit includes a Fizeau interferometer IF including an optical unit 17 and mirror 22 . The optical unit 17 includes a Fizeau surface which splits a light beam into a reference light beam and a test light beam. The mirror 22 reflects the test light beam having passed through the projection optical system PL. The optical unit 17 is mounted on the original stage 5 . The mirror 22 is mounted on the substrate stage 8.