| 摘要 |
An apparatus for cleaning a chamber in an amorphous carbon-film depositing process and a method of cleaning the chamber using the same are provided to increase energy of cleaning gas, using a gas separating shower head having gas separating modules and gas spraying modules by supplying first and second gases to gas supply modules and supplying a third gas to third gas spraying modules. A shower head(140) comprises gas supply modules(210a,210b), a gas separating shower head having gas separating modules and gas spraying modules(230), and third gas supply modules(210c), and third gas spraying modules(250a,250b). First and second gases are separately supplied to the gas supply modules. The gas supply modules include outer and inner supply pipes which are separated from each other. The gas separating modules separate and disperse the first and second gases. The gas separating modules include first dispersion areas(220a) connected with the outer supply pipe, and second dispersion areas(220b) connected with the inner supply pipe. A third gas spraying module, which surrounds an outer wall of the shower head, sprays a third gas to a reaction chamber.
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