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发明名称
Removing developed photoresist
摘要
申请公布号
GB2296576(A)
申请公布日期
1996.07.03
申请号
GB19950008608
申请日期
1995.04.27
申请人
* MITSUBISHI DENKI KABUSHIKI KAISHA;* RYODEN SEMICONDUCTOR SYSTEM ENGINEERING CORPORATION
发明人
HIROYUKI * SHIMA;TADASHI * NISHIOKA
分类号
H01L21/302;G03F7/42;H01L21/027;H01L21/3065;H01L21/312;H01L21/3213;(IPC1-7):G03F7/42
主分类号
H01L21/302
代理机构
代理人
主权项
地址
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