发明名称 |
METHOD FOR MAKING REFRACTIVE INDEX OF SILICA GLASS HIGH |
摘要 |
PURPOSE: To efficiently increase the refractive index of a silica glass in a short time. CONSTITUTION: In this method, the refractive index in the irradiation region (1A) is efficiently increased by irradiating the prescribed irradiation region (1A) of the silica glass (1) with X rays (2) having a wavelength of 1.2-7.0Åand exciting K shell electrons of a silicon atom in the irradiation region (1A) with the X rays (2). |
申请公布号 |
JPH08169731(A) |
申请公布日期 |
1996.07.02 |
申请号 |
JP19950247495 |
申请日期 |
1995.09.26 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
KANIE TOMOHIKO;KATAYAMA MAKOTO |
分类号 |
G21K5/02;C03C23/00;G02B6/13;H05H13/04;(IPC1-7):C03C23/00 |
主分类号 |
G21K5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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