| 摘要 |
A pellicle (400, 1100) for a lithographic device (100) and a method for its manufacture is disclosed. The pellicle (400, 1100) comprises a carbon-based film (405, 1120, 1200) having a thickness of between 0.1 nm and 10 nm and at least one layer of cross-linked aromatic molecules, heteroaromatic molecules, or polyyne-based or polyene-based amphiphilic molecules. The carbon-based film (405, 1120, 1200) has a periphery (402) and a center portion (404) and the center portion (404) is transparent to the radiation beam (130). A support structure (410, 1110, 1240) is coupled at least to the periphery (402) of the car- bon-based film (405, 1120, 1200). |
