发明名称 Methods of manufacturing metal wiring buried flexible substrate and flexible substrates manufactured by the same
摘要 Disclosed are a method of manufacturing a metal wiring buried flexible substrate and a flexible substrate manufactured by the same. The method includes coating a sacrificial layer including a polymer soluble in water or an organic solvent, or a photodegradable polymer on a substrate (Step 1), forming a metal wiring on the sacrificial layer in Step 1 (Step 2), forming a metal wiring buried polymer layer by coating a curable polymer on the sacrificial layer including the metal wiring formed thereon in Step 2 and curing (Step 3) and separating the polymer layer in Step 3 from the substrate in Step 1 by removing through dissolving in the water or the organic solvent or photodegrading only the sacrificial layer present between the substrate in Step 1 and the polymer layer in Step 3 (Step 4).
申请公布号 US9445504(B2) 申请公布日期 2016.09.13
申请号 US201214004557 申请日期 2012.04.19
申请人 Korea Institute of Machinery and Materials 发明人 Kang Jae Wook;Kim Do Geun;Kim Jong Kuk;Jung Sung Hun;Song Myungkwan;You Dae Sung;Kim Chang Soo;Nam Kee Seok
分类号 H05K3/00;H05K3/10;H05K1/02;H05K3/20;H05K1/03;H05K3/24 主分类号 H05K3/00
代理机构 Fredrikson & Byron, P.A. 代理人 Fredrikson & Byron, P.A.
主权项 1. A method of manufacturing a metal wiring buried flexible substrate comprising: coating a sacrificial layer including a polymer soluble in water or an organic solvent, or a photodegradable polymer on a substrate (Step 1); forming a metal wiring on the sacrificial layer in Step 1 (Step 2); forming a metal wiring buried polymer layer by coating a curable polymer on the sacrificial layer including the metal wiring formed thereon in Step 2 and curing (Step 3); and separating the polymer layer in Step 3 from the substrate in Step 1 by removing through dissolving in the water or the organic solvent or photodegrading only the sacrificial layer present between the substrate in Step 1 and the polymer layer in Step 3 (Step 4).
地址 Daejeon KR