发明名称 FOCUSING UNIT FOR AN ARC DISCHARGE APPARATUS USED FOR PLATING
摘要 <p>Focusing unit for generating a focusing magnetic field in an arc discharge apparatus designed for the plating of objects (7), said arc discharge apparatus having a cathode (2) and an anode (3) for producing a plasma beam by means of an arc set up between them, an igniter (4) for starting an arc and a cylindrical winding (9) for accelerating the plasma beam. The focusing unit (10) is placed in conjunction with the cathode (2) so that it produces in the region of arc discharge a magnetic field oriented in the direction of the longitudinal axis (11) of the cathode (2) to focus the plasma beam to a desired point in the cross section of the cylindrical winding (9), preferably to its centre.</p>
申请公布号 WO1996018754(A1) 申请公布日期 1996.06.20
申请号 FI1995000677 申请日期 1995.12.12
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