Shadow mask adopting electron reflective layer, for CRT
摘要
A method for manufacturing a shadow mask adopting electron-reflection layer on the surface of the shadow mask where electron beams collide, is characterised in that the electron reflection layer is formed by spray coating a composition comprising inorganic binder and bismuth ammonium citrate solution (BACS) containing 10-50 wt.% of bismuth, in which the amount of BACS is 70 wt.% or more, and selectively heat-treating the coated layer.
申请公布号
DE19526166(A1)
申请公布日期
1996.06.13
申请号
DE19951026166
申请日期
1995.07.18
申请人
SAMSUNG DISPLAY DEVICES CO., LTD., KYUNGGI, KR
发明人
KIM, JAE-MYUNG, SUWON, KR;RHO, HWAN-CHUL, KUNPO, KR;CHOI, HONG-GYU, SUWON, KR