发明名称 Shadow mask adopting electron reflective layer, for CRT
摘要 A method for manufacturing a shadow mask adopting electron-reflection layer on the surface of the shadow mask where electron beams collide, is characterised in that the electron reflection layer is formed by spray coating a composition comprising inorganic binder and bismuth ammonium citrate solution (BACS) containing 10-50 wt.% of bismuth, in which the amount of BACS is 70 wt.% or more, and selectively heat-treating the coated layer.
申请公布号 DE19526166(A1) 申请公布日期 1996.06.13
申请号 DE19951026166 申请日期 1995.07.18
申请人 SAMSUNG DISPLAY DEVICES CO., LTD., KYUNGGI, KR 发明人 KIM, JAE-MYUNG, SUWON, KR;RHO, HWAN-CHUL, KUNPO, KR;CHOI, HONG-GYU, SUWON, KR
分类号 H01J9/14;H01J29/07;(IPC1-7):H01J29/07 主分类号 H01J9/14
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