PROCESS AND DEVICE FOR SUBLIMATION GROWING SILICON CARBIDE MONOCRYSTALS
摘要
A reaction chamber (2) is surrounded by a gas-tight wall (20) of which at least the inner side (21) that faces the reaction chamber (2) is made of silicon carbide produced by a CVD process. At least part of the silicon carbide that constitutes the wall (20) is sublimated and grown as a silicon carbide monocrystal (4) on a crystal seed (3).
申请公布号
WO9617113(A1)
申请公布日期
1996.06.06
申请号
WO1995DE01576
申请日期
1995.11.14
申请人
SIEMENS AKTIENGESELLSCHAFT;STEPHANI, DIETRICH;VOELKL, JOHANNES