发明名称 PROCESS AND DEVICE FOR SUBLIMATION GROWING SILICON CARBIDE MONOCRYSTALS
摘要 A reaction chamber (2) is surrounded by a gas-tight wall (20) of which at least the inner side (21) that faces the reaction chamber (2) is made of silicon carbide produced by a CVD process. At least part of the silicon carbide that constitutes the wall (20) is sublimated and grown as a silicon carbide monocrystal (4) on a crystal seed (3).
申请公布号 WO9617113(A1) 申请公布日期 1996.06.06
申请号 WO1995DE01576 申请日期 1995.11.14
申请人 SIEMENS AKTIENGESELLSCHAFT;STEPHANI, DIETRICH;VOELKL, JOHANNES 发明人 STEPHANI, DIETRICH;VOELKL, JOHANNES
分类号 C30B29/36;C30B23/00 主分类号 C30B29/36
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