TEMPERATURE STABILIZED SELECTIVE RADIATION MATERIAL

摘要

PURPOSE: To obtain a temperature stabilized selective radiation material using upper air or cosmic space as a cryogenic source by forming a vanadium dioxide film to which tungsten is added on a black substrate and forming a silicon monoxide film thereon. CONSTITUTION: This selective radiation material is formed by providing the vanadium dioxide film 2 to which tungsten is added on the upper surface of the black substrate 1 made of an aluminum coated with a black paint and forming the silicon monoxide film 3 thereon. The thickness of the film 2 is about 0.1μm, the thickness of the film 3 is about 1μm and the thickness of the substrate 1 is not restricted if not transmissive to infrared rays. The selective radiation material is mitigated in sensitive film thickness dependency and attains a fixed stable temp. lowering.