发明名称 Method and apparatus for stressing, burning in and reducing leakage current of electronic devices using microwave radiation
摘要 The described invention is directed to microwave methods for burning-in, electrical stressing, thermal stressing and reducing rectifying junction leakage current in fully processed semiconductor chips individually and at wafer level, as well as burning in and stressing semiconductor chip packaging substrates and the combination of a semiconductor chip mounted onto a semiconductor chip packaging substrate. Microwaves burn-in devices in a substantially shorter period of time than conventional burn-in techniques and avoid the need for special workpiece holders which are required by conventional stress and burn-in techniques. Additionally, microwave methods are described for reducing the leakage current of recitfying junctions, such as PN junctions and Schottky barrier diode junctions of semiconductor devices on fully processed semiconductor chips and wafers.
申请公布号 US5519193(A) 申请公布日期 1996.05.21
申请号 US19920966960 申请日期 1992.10.27
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 FREIERMUTH, PETER E.;GINN, KATHLEEN S.;HALEY, JEFFREY A.;LAMAIRE, SUSAN J.;LEWIS, DAVID A.;MILLS, GAVIN T.;REDMOND, TIMOTHY A.;TSANG, YUK L.;VAN HORN, JOSEPH J.;VIEHBECK, ALFRED;WALKER, GEORGE F.;YANG, JER-MING;LONG, CLARENCE S.
分类号 G01R31/26;G01R31/28;G01R31/311;H01L21/265;H01L21/268;H01L21/326;H01L21/329;(IPC1-7):H05B6/80 主分类号 G01R31/26
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