| 摘要 |
PURPOSE: To provide a positive chemically amplifying resist compsn. containing small amt. of metal impurities of sodium and potassium by incorporating a specified compd. CONSTITUTION: This compsn. contains a compd. which produces acid by irradiation with active rays or radiation, a resin which is insoluble in water and soluble in alkali soln., and a dissolution preventing compd. This dissolution preventing compd. has alkylester groups expressed by the formula and low mol.wt. as <=3000, can be decomposed with acid, and increases its solubility in an alkali developer by the effect of acid. The amt. of sodium and potassium in the resist compsn. is <=30ppb for each. In the formula, R01 , R02 are hydrogen atoms, alkyl groups or aryl groups which may have substituents, R03 to R05 are hydrogen atoms, alkyl groups, cycloalkyl groups, alkoxy groups, aryl groups, alkenyl groups, or aralkyl groups which may have substituents, two of R03 to R05 may be bonded to form a ring, and N is an integer 1 to 10. |
