发明名称 Housing for semiconductor device and method of manufacturing
摘要 <p>Disclosed is a housing for a semiconductor device improved not to cause thermal distortion. The housing is formed on an A l -Si compound material and includes a housing member having a space for housing the semiconductor device. Occlusion gas contained in the A l -Si compound material is removed such that at least nitrogen gas in the occlusion gas is 0.1 percentage by weight or less. Since the housing member contains no occlusion gas, the housing cause no thermal distortion even though heat is applied thereafter. <IMAGE></p>
申请公布号 EP0439128(B1) 申请公布日期 1996.04.17
申请号 EP19910100780 申请日期 1991.01.22
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 OSADA, MITSUO,;ABE, YUGAKU,;HAYASHI, TETSUYA,
分类号 H01L23/08;H01L21/48;H01L23/06;(IPC1-7):H01L23/06;H01L23/373 主分类号 H01L23/08
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