| 摘要 |
PURPOSE: To ensure superior resolution, pattern shape, sensitivity, developability, process stability, contrast, heat resistance removability from a substrate and adhesiveness by incorporating a specified copolymer and a radiation sensitive acid generating agent. CONSTITUTION: A copolymer having repeating units represented by formula I and repeating units represented by formula II and a radiation sensitive acid generating agent are incorporated. In the formula I, R<1> is H or methyl, R<2> is H, alkyl, alkoxyl, aryl, aryloxy or aralkyl, plural R<2> 's may be different from each other, (n) is an integer of >=1, (m) is 0 or an integer of >=1 and n+m<=5. In the formula II, A is a divalent O or S atom, R<3> is H or methyl, each of R<4> -R<8> is H, alkyl, alkoxyl, alkylthio, aryl, etc., and R<7> and R<8> may bond to each other. |
