发明名称 Ablative imaging by proximity lithography
摘要 The present invention includes a method of creating a shaped image in a workpiece using a high energy source, with the method comprising positioning a layer proximate the workpiece such that the layer prevents debris from the workpiece from dispersing, and directing radiation from the high energy source through the layer to the workpiece, the layer substantially transparent to radiation emitted by the high energy source such that the high energy source is capable of forming the shaped image.
申请公布号 US5501944(A) 申请公布日期 1996.03.26
申请号 US19950381022 申请日期 1995.01.31
申请人 MINNESOTA MINING AND MANUFACTURING COMPANY 发明人 HILL, JEFFREY B.;OUDERKIRK, ANDREW J.;STUBBS, DANIEL P.;JACKSON, ROBERT S.;DUNN, DOUGLAS S.
分类号 B41C1/05;B23K26/06;B41M5/24;G03F7/20;G06K1/12;G11B5/596;G11B5/84;G11B5/855;H05K3/00;(IPC1-7):G03F7/22;G03F5/00 主分类号 B41C1/05
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