| 摘要 |
PURPOSE: To set a position determining mark in light exposure and separation and to improve processing accuracy by irradiating a photosensitive glass material with excimer laser in a method for exposing the photosensitive glass material, separating, etching, etc. CONSTITUTION: A photosensitive glass material is exposed by using a photomask having formed an exposable pattern simultaneously on plural part materials and the exposed materials are cut and separated into plural part materials. The separated part materials are provided with desired channels, etc., by a process including thermal development and etching. In the processing method, before the cutting and before or after light exposure, the photosensitive glass materials are irradiated with excimer laser at fixed positions. Consequently, light transmission of the irradiated part is reduced without thermal development and the part is changed in color. The number of processes is decreased and processability can be improved by using the part changed in color as a position determining mark in light exposure or cutting. |
