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发明名称
Verfahren und Vorrichtung zur Herstellung von Halbleiterschichten
摘要
申请公布号
DE4329268(C2)
申请公布日期
1996.03.07
申请号
DE19934329268
申请日期
1993.08.31
申请人
DEUTSCHE FORSCHUNGSANSTALT FUER LUFT- UND RAUMFAHRT E.V., 53111 BONN, DE
发明人
KLOSE, MANFRED, DR., 70569 STUTTGART, DE;BRIEGER, MICHAEL, DR., 70437 STUTTGART, DE;ALLENSPACHER, PAUL, DIPL.-ING.-CHEM., 73265 DETTINGEN, DE
分类号
C23C14/28;(IPC1-7):H01L21/203;C30B23/06
主分类号
C23C14/28
代理机构
代理人
主权项
地址
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