发明名称 |
Photosensitive compositions containing a polymer with carboxyl and hydroxyphenyl groups, a compound with multiple ethylenic unsaturation and a photo-acid generator |
摘要 |
A photosensitive composition which comprises, as essential components: (A) a polymer having carboxyl group(s) and hydroxyphenyl group(s), or (A') a polymer having carboxyl group(s) and (A'') a polymer having hydroxyphenyl group(s), (B) a compound having at least two vinyl ether groups in the molecule, and (C) a compound which generates an acid when irradiated with an actinic ray, and which is useful as a positive type photoresist having high resolution and excellent formability of fine image pattern, a material for printing, etc.; and a process for pattern formation using said composition.
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申请公布号 |
US5496678(A) |
申请公布日期 |
1996.03.05 |
申请号 |
US19940227346 |
申请日期 |
1994.04.14 |
申请人 |
KANSAI PAINT CO., LTD. |
发明人 |
IMAI, GENJI;IWASAWA, NAOZUMI;YAMAOKA, TSUGUO |
分类号 |
G03F7/004;G03F7/027;(IPC1-7):G03F7/021;G03F7/029;G03F7/032 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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