发明名称 Couche antiréfléchissante et procédé pour fabriquer un dispositif semi-conducteur en utilisant une telle couche.
摘要 <p>A method for manufacturing an anti-reflective layer comprises the steps of coating a polymer solution containing at least one compound selected from the group consisting of phenol-based resins, water-soluble resins and acryl resins as a main component, and then baking at a high temperature. The method is simplified and the layer's reflectance is greatly enhanced.</p>
申请公布号 FR2709869(B1) 申请公布日期 1996.02.02
申请号 FR19940005849 申请日期 1994.05.11
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 PARK CHUN-GEUN;YEO GI-SUNG;PARK JUNG-CHUL
分类号 G03F7/11;G03F7/09;G03F7/40;H01L21/027;H01L21/312;(IPC1-7):H01L21/027 主分类号 G03F7/11
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