发明名称 |
Couche antiréfléchissante et procédé pour fabriquer un dispositif semi-conducteur en utilisant une telle couche. |
摘要 |
<p>A method for manufacturing an anti-reflective layer comprises the steps of coating a polymer solution containing at least one compound selected from the group consisting of phenol-based resins, water-soluble resins and acryl resins as a main component, and then baking at a high temperature. The method is simplified and the layer's reflectance is greatly enhanced.</p> |
申请公布号 |
FR2709869(B1) |
申请公布日期 |
1996.02.02 |
申请号 |
FR19940005849 |
申请日期 |
1994.05.11 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
PARK CHUN-GEUN;YEO GI-SUNG;PARK JUNG-CHUL |
分类号 |
G03F7/11;G03F7/09;G03F7/40;H01L21/027;H01L21/312;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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