TREATMENT METHOD AND TREATMENT APPARATUS OF WASH OUT LIQUID FOR PHOTOSENSITIVE RESIN PLATE

摘要

PURPOSE:To maintain a wash-out liquid clean at all times and to make stable wash-out operations of many sheets of the photosensitive resin plates over a long period of time possible without discarding the wash-out liquid. CONSTITUTION:This treatment method of the wash-out liquid of the photosensitive resin plates comprises treating the wash-out liquid. contg. the resins generated in a method of developing the photosensitive resin plates by rubbing out the unexposed parts while immersing the resin plates into the wash-out liquid after exposure. The wash-out liquid 11 contg. the resins are filtered by a filter 13 and the filtrate thereof is reused as the wash-out liquid in this method. On the other hand, the filter 13 clogged by the resins is successively irradiated with light to cure the resins sticking to the filter 13 and thereafter, the resins are stripped from the filter and the filter is reused. This treatment apparatus of the wash-out liquid for the photosensitive resin plates is constituted to filter the wash-out liquid 11 for the photosensitive resin plates with the filter 13 to remove the resins therefrom and to reuse the filtrate as the wash-out liquid. The apparatus described above is provided with a photoirradiation section 7 for curing the resins and a stripping section 8 for the cured resins.