PHOTOMASK AND ITS PRODUCTION

摘要

PURPOSE:To provide a halftone phase shift mask with which reflected light of sufficient intensity is obtainable in order to position a photomask from alignment marks and a process for producing such photomask. CONSTITUTION:This photomask has a transparent substrate 6 which is transparent to exposing light, translucent films which are formed in first regions including at least regions 4 forming the patterns to be transferred on the surface of this transparent substrate 6 and reflection films 1 which are formed in second regions including regions 5 for forming the alignment marks for the purpose of at least positioning of the mask among the regions exclusive of the first regions on the surface of the transparent substrate 6 and afford the reflectivity of the exposing light of >=2 times the reflectivity on the exposed transparent substrate 6.