| 摘要 |
PURPOSE:To obtain a chromium-base film excellent in low reflectivity, adhesion and uniformity by forming a chromium-base film with the reflactance in the wavelength in the visible region on a transparent substrate by high-frequency excitation plasma deposition. CONSTITUTION:A chromium-base film having <5% reflectance in the visible region of wavelength 550nm is formed on a transparent substrate of glass, etc., by the high-frequency excitation plasma deposition such as ion plating. At least a part of the film consists of >=1 kind of chromium compd. such as chromium oxide and chromium nitride. Consequently, a pinhole of at least 10mum is not recognized after deposition, and a low-reflection chromium-base film which is not contaminated or deposited with foreign matter is obtained. The film thickness is controlled to about 600-1700Angstrom . |
