ARTICLE WITH THIN FILM STRUCTURE AND THIN FILM STRUCTURE FORMATION

摘要

PURPOSE: To form a thin film structure body having a tapered shape part which is achieved by differently etching a layer in which local etching rate is changed. CONSTITUTION: A layer having local etching rate to an etching which changes in the thickness direction of the layer is formed by vapor deposition (30). A pattern of mask material covering a part of a layer having the form of a shape part is formed by using lithography (32). A region which is not covered with the pattern of the mask material is eliminated by etching. After etching, a covered part of the layer forms the shape part having an edge, the edge is etched by using etching agent, and a side wall profile of the edge is tapered (34). The pattern of the mask material is eliminated (36).