发明名称 COMPOSITION FOR NONDECAYABLE PHOTORESIST PEELING
摘要 PURPOSE: To suppress the corrosion of a substrate without losing releasability by incorporating the respectively specified org. polar solvent, amino compd. and amino acid. CONSTITUTION: This composition consists of about 85-10wt.% org. polar solvent having >=3.5 dipole moment, about 10-40wt.% amine compd. shown by formula I, about 5-30wt.% amino acid expressed by formula II and about 0-20wt.% water. All the precentages are based on the weight of the release agent composition. In formula I, (n) and (m) are an integer of 1 to 5, X is hydrogen, alkyls, etc., Y is -O- or -NH-, and Z is hydrogen, -OH, etc. In formula II, (p) is an integer of 1 to 3, and R<1> and R<2> are hydrogen or formula III, and R<3> and R<4> are hydrogen or formula IV. In formula III, R<5> to R<7> are hydrogen, -OH, alkoxyphenyls, etc. In formula IV, X<1> and Z<1> are hydrogen, -OH, alkoxyls, etc., and at least one of them is -OH, etc.
申请公布号 JPH07295240(A) 申请公布日期 1995.11.10
申请号 JP19950090427 申请日期 1995.04.17
申请人 O C G MICROELECTRON MATERIALS INC 发明人 KENJI HONDA
分类号 G03F7/42;H01L21/027;(IPC1-7):G03F7/42 主分类号 G03F7/42
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