发明名称 PHOTOSETTING RESIN COMPOSITION
摘要 <p>PURPOSE:To obtain a photosetting resin compsn. excellent in water developability, that is, easy to develop with water and to obtain a photosetting resin compsn. excellent in heat resistance and adhesive property after setting, ensuring satisfactory sensitivity of a resist material to light, giving a clear image and excellent also in shelf stability. CONSTITUTION:This photosetting resin compsn. contains 100 pts.wt. polymer obtd. by copolymerizing 5-70wt.% monomer having an epoxy group with 30-80wt.% monomer having a tert. nitrogen atom and 0.01-20 pts.wt. optical proton generating agent. The polymer may be obtd. by copolymerizing the monomers with other monomer copolymerizable with the monomers. This resin compsn. is blended with a reactive diluent so as to regulate the viscosity.</p>
申请公布号 JPH07261391(A) 申请公布日期 1995.10.13
申请号 JP19940050767 申请日期 1994.03.22
申请人 NIPPON OIL & FATS CO LTD 发明人 OKUO MASAMI;HIGUCHI YOSHIKI;SUYAMA SHUJI
分类号 G03F7/004;C08F290/00;C08F299/02;C09D5/00;G02B5/20;G03F7/027;G03F7/028;G03F7/038;H05K3/28;(IPC1-7):G03F7/038 主分类号 G03F7/004
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