VAPOR GROWING METHOD OF COMPOUND SEMICONDUCTOR THIN FILM,申请号JP19940030402-传众专利搜索

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发明名称	VAPOR GROWING METHOD OF COMPOUND SEMICONDUCTOR THIN FILM
摘要
申请公布号	JPH07240371(A)	申请公布日期	1995.09.12
申请号	JP19940030402	申请日期	1994.02.28
申请人	JAPAN ENERGY CORP	发明人	IKEDA EIJI
分类号	H01L21/205;H01L21/20;(IPC1-7):H01L21/20	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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