发明名称 Semiconductor device with insulating film having trench
摘要 The semiconductor device has a semiconductor substrate (11) and an insulation film (14) on top of the substrate. The insulation film has a trench (16) with at least one side wall, inclined in the upper part of the trench. There is a conducting film on or in the trench, stretching along the trench, and the inclined side wall is built up from a second insulating film (20).
申请公布号 DE4400032(C1) 申请公布日期 1995.08.31
申请号 DE19944400032 申请日期 1994.01.03
申请人 GOLDSTAR ELECTRON CO., LTD., CHEONGJU, KR 发明人 JUN, YOUNG KWON, SEOUL/SOUL, KR
分类号 H01L21/768;H01L23/485;(IPC1-7):H01L23/522 主分类号 H01L21/768
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