发明名称 |
Semiconductor device with insulating film having trench |
摘要 |
The semiconductor device has a semiconductor substrate (11) and an insulation film (14) on top of the substrate. The insulation film has a trench (16) with at least one side wall, inclined in the upper part of the trench. There is a conducting film on or in the trench, stretching along the trench, and the inclined side wall is built up from a second insulating film (20).
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申请公布号 |
DE4400032(C1) |
申请公布日期 |
1995.08.31 |
申请号 |
DE19944400032 |
申请日期 |
1994.01.03 |
申请人 |
GOLDSTAR ELECTRON CO., LTD., CHEONGJU, KR |
发明人 |
JUN, YOUNG KWON, SEOUL/SOUL, KR |
分类号 |
H01L21/768;H01L23/485;(IPC1-7):H01L23/522 |
主分类号 |
H01L21/768 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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