METHOD AND SYSTEM ELECTRON BEAM LITHOGRAPHY

摘要

PURPOSE:To provide method and system for electron beam lithography based on frame scanning suitable for writing a relatively simple figure in which a relatively wide writing range is realized at low cost using an existing conventional scanning electron microscope without requiring any modification in the body thereof. CONSTITUTION:A scan synchronizing section 20 predicts the density of irradiating current within a scanning frame under control of a figure processor 10 and generates a gradation figure split into various degrees of gradation. Frame scanning is then performed for all gradations such that the time staying in a pixel will be constant at each gradation. Electron beam scanning is performed by means of a deflection coil DF in a scanning electron microscope 30 and selection of a specific gradation is made by driving an electronic shutter SH.