发明名称 FORMATION OF ANTIREFLECTION FILM
摘要 PURPOSE:To provide an optical device of high visibility and high permeability at low cost by forming an antireflection film of high reliability over the surface of a transparent base using a method that provides a high mass-producing effect. CONSTITUTION:At least one or more of the following processes are employed: (1) activating the surface of a transparent base; (2) forming a coupling compound layer 2 over the surface of the transparent base 1 by reacting the surface with a silicon compound; (3) applying a fluorine-containing organic solution having at least a monomer, oligomer or polymer of a polymeric fluorine-containing organic compound dissolved therein to the surface of the transparent base 1 into a specific thickness between 0.05mum and 1mum, and polymerizing it using either a heating, ultraviolet irradiation or electron beam irradiation method to form a thin film 3 of fluorine-containing high polymer; (4) subsequent to formation of the thin film 3 of fluorine-containing high polymer over the surface of the transparent base 1, accelerating polymerization and crosslinking the fluorine-containing high polymer through electron beam irradiation, thus hardening the thin film 3.
申请公布号 JPH07168004(A) 申请公布日期 1995.07.04
申请号 JP19930293501 申请日期 1993.11.24
申请人 SEIKO EPSON CORP 发明人 MIYASHITA SATORU
分类号 G02B1/11;C08J7/00;C08J7/04 主分类号 G02B1/11
代理机构 代理人
主权项
地址