| 摘要 |
PURPOSE:To provide an exposure system without the fear of generating transfer slippage caused by vibration generated from an exposure quantity control device. CONSTITUTION:An SR-X-ray L magnified in a Y-axis direction by a cylindrical mirror 2 has X-ray intensity distribution in the Y-axis direction. An exposure quantity control device 4 has an X-aperture stage 4b provided with an opening 9, and the X-aperture stage 4b is provided with an aperture movable member 4c having a protruding part 4e protruding in the X-axis direction into the opening 9. The protruding part 4e of the aperture movable member 4c has the shape and dimensions based on the X-ray intensity distribution of the SR-X-ray L, and the exposure quantity of a wafer W is uniformed by making the X-aperture stage 4b scan at constant speed in the X-axis direction. |
