| 摘要 |
The quinone diazide positive resist compsn. for i-rays is composed of a novolak resin (A) having 3,000-30,000 average molecular wt., and 10-15 wt.% of a 2,3,4,4-tetrahydroxy benzophenone-1,2-naphthoquinone diazide sulfonic acid ester (B) w.r.t. the resin (A). The positive resist compsn. is produced by reacting 1,2- naphthoquinone diazide-5-sulfonyl chloride and 2,3,4,4'- tetrahydroxy benzophenone in the presence of triethyl amine catalyst. The resist compsn. gives a good pattern profile in the i-rays on the base of a superior solution-inhibiting effect.
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