| 摘要 |
<p>PURPOSE:To prevent the defective display of a liquid crystal matrix panel by forming an insulating oxide film on the whole surface of a gate line and a gate electrode with anodic oxidation. CONSTITUTION:A gate electrode G and a gate line X of aluminum are anodized to form an insulating oxide film 8 thereon. Next, silicon nitride is deposited to form an insulating layer 7 covering an insulating oxide film 8, and further a drain line Y is formed on the insulating layer 7. Therefore, a gate insulating layer on a gate electrode G is constituted of a multilayer body of the insulating oxide film 8 which is the surface insulating film of the gate electrode G and the insulating layer 7. Therefore, the layered insulating film at the intersection of the gate line X and the drain line Y is also constituted of the multilayer body of the insulating oxide film 8 and the insulating layer 7. Thereby, short- circuit and the like which are generated at the intersection of the lines X and Y can be eliminated, so that the defective display of a liquid crystal matrix panel is prevented.</p> |
