| 摘要 |
<p>PURPOSE:To provide a positive resist composition free from the hindrance to the performance exhibited originally by a resist at the time of applying particularly for a color filter and easy in process control, etc., at the time of producing the color filter. CONSTITUTION:The positive resist composition contains a compound having at least one group selected from a family composed of sulfonamide, carboxylic acid amide and ureide, in each of which one hydrogen atom is substituted, a dissolution inhibitor and an organic solvent. Because the resist composition does not contain a matrix resin, in the case of using for the color filter, the color filter excellent in properties such as color density and color reproducibility ad thin in film thickness is obtained.</p> |
