| 摘要 |
PURPOSE:To provide an optical element having a multilayer film pattern fine in wide range without a defect by disposing an intermediate film between the multilayer film and the base of the optical element with the pattern of the multilayer film to be irradiated with X-rays. CONSTITUTION:The pattern of a multilayer film 2 to be irradiated with X-rays being formed by successively laminating thin films of at least two kinds of material different in the refractive index is disposed on a base 1, and an intermediate film 4 is disposed between the base 1 and the multilayer film 2. It is desirable that the intermediate film 4 is formed out of a material with slower etching speed than the average value of the etching speed of each material forming the multilayer film 2. The intermediate layer 4 can be also formed out of the same material as the material with the slowest etching speed out of the material forming the multilayer film 2. The material desirably used for the intermediate film 4 is C, Cr, Mo, Mn, V, SiO2, Si3N4, Sic or BN, and the compound film of these materials can be also used as the intermediate film 4. The thickness of the intermediate film 4 is desirably in a range of 10nm to 1mum, more desirably in a range of 100nm to 1mum. |
