摘要 |
PCT No. PCT/EP94/02908 Sec. 371 Date Jun. 17, 1996 Sec. 102(e) Date Jun. 17, 1996 PCT Filed Sep. 1, 1994 PCT Pub. No. WO95/06899 PCT Pub. Date Mar. 9, 1995A method for three dimensional lithography including the steps of providing a substrate (44) having surfaces extending in three dimensions and a light sensitive coating and illuminating the substrate via a mask (40) with light impinging on the surfaces at a non-perpendicular angle with respect thereto. |