| 摘要 |
The invention pertains to a device for thermal dissociation of gases and a device for depositing diamond-like carbon films on a substrate (3), with an evacuatable reaction chamber (1) to hold the substrate (3), with at least one gas inlet (7) for feeding a reactant gas into the reaction chamber and with a device for activating the reactant gas. A separate heating apparatus (9, 10, 11) heats at least one part of the inner wall of the inlet (7). The invention also pertains to a device for thermal dissociation of gases. |
