WASHING METHOD AND WASHING DEVICE FOR SUBSTRATE AFTER RUBBING TREATMENT

摘要

PURPOSE:To prevent the generation of unequal washing on a substrate surface in the case of washing of substrates after a rubbing treatment according to a single wafer treatment system using water and pure water in a stage for forming the oriented films of a liquid crystal display element. CONSTITUTION:A fore-stage treating chamber 10 is disposed on the side just before washing chambers 12, 14 for washing the substrates W after the rubbing treatment. Air knives 30 for removing the foreign matter sticking on the substrate surfaces and a high-pressure spray pipe 20 for allowing the pure water 28 to flow down onto the substrate surfaces to cover the entire part of the substrate surfaces in a laminar form with the pure water are successively disposed within this fore-stage treating chamber.