| 摘要 |
PURPOSE:To eliminate the need for half-split treatment every time the thickness of a sample mounted into a sample high-temperature device is also changed. CONSTITUTION:In a sample high-temperature device for an X-ray diffraction device keeping the temperature of a sample 1 used for X-ray diffractometry at a high temperature, a sample holder 22 with an upper-side positioning member 30 and a lower-side positioning member 32 for bringing the X-ray irradiation surface 1a of the sample 1 into surface-contact and a wedge 8 pushing the sample 1 from the rear of the sample and pushing the X-ray irradiation surface 1a of the sample against the positioning members 30, 32 are installed. Even when the thickness of the sample 1 is changed variously, the X-ray irradiation surface 1a of the sample 1 is positioned at a constant position brought into surface-contact with the positioning members 30, 32 at all times. |
