| 摘要 |
PURPOSE:To form an amorphous hard carbon film excellent in adhesion with a substrate by vapor-depositing hard amorphous carbon film containing specified proportions of silicon and nitrogen on the substrate. CONSTITUTION:Tetramethylsilane controlled at a certain temp. is bubbled with nitrogen gas containing helium gas to produce a mixture gas, which is introduced together with methane gas into plasma in a vacuum chamber. The molar ratio of methane, tetramethylsilane and nitrogen is controlled to the range of 5:(0.1-1.0):(0.2-2.0). Thereby, the hard amorphous carbon film containing 10-35atm% silicon, 0.1-10atm% nitrogen and 0.35-5.0X10<22>atom/cm<3> hydrogen is formed on the substrate by vapor deposition. The obtd. film excellent in adhesion, improved in wear resistance and sliding characteristics and having about 2000-5000 Vickers hardness is obtd. |
