发明名称 METHOD OF CONTROLLING CIRCUIT LITHOGRAPHY MACHINE
摘要 PURPOSE:To perform a lithography while discharging a thick film paste at a necessary time by starting, stopping the discharge of the paste while synchronizing with the movement of a nozzle corresponding to the type of the paste and the variation in a lithography speed. CONSTITUTION:A nozzle 10 for discharging thick film paste 9 and a sensor 13 disposed at a predetermined distance forwardly of a relatively moving direction of the nozzle can be accurately moved on a lithography trace designated with NC data. Further, even if the nozzle 10 and the sensor 13 are altered at the positions in the structure of a thick film circuit lithography apparatus, it can be coped with variation in the number of shifts at each operation unit. Further, in a thick film paste discharge control operation and a X-Y table moving control operation, it can be coped with the variation in a discharging timing in response to the variation in the type of the paste and the moving speed of the table 12. Thus, the paste on a desired lithography trace can be accurately provided on the basis of the NC data.
申请公布号 JPH0234985(A) 申请公布日期 1990.02.05
申请号 JP19880184961 申请日期 1988.07.25
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 HANADA KEIJI;IHARA AKIRA
分类号 B41F17/36;B43L13/00;H05K3/10;H05K3/12 主分类号 B41F17/36
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